<?xml version="1.0" encoding="UTF-8"?><!DOCTYPE article  PUBLIC "-//NLM//DTD Journal Publishing DTD v3.0 20080202//EN" "http://dtd.nlm.nih.gov/publishing/3.0/journalpublishing3.dtd"><article xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" dtd-version="3.0" xml:lang="en" article-type="research article"><front><journal-meta><journal-id journal-id-type="publisher-id">JECTC</journal-id><journal-title-group><journal-title>Journal of Electronics Cooling and Thermal Control</journal-title></journal-title-group><issn pub-type="epub">2162-6162</issn><publisher><publisher-name>Scientific Research Publishing</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.4236/jectc.2017.73006</article-id><article-id pub-id-type="publisher-id">JECTC-77831</article-id><article-categories><subj-group subj-group-type="heading"><subject>Articles</subject></subj-group><subj-group subj-group-type="Discipline-v2"><subject>Engineering</subject><subject> Physics&amp;Mathematics</subject></subj-group></article-categories><title-group><article-title>
 
 
  Fabrication and Characterization of PLD-Grown Bismuth Telluride (Bi&lt;sub&gt;2&lt;/sub&gt;Te&lt;sub&gt;3&lt;/sub&gt;) and Antimony Telluride (Sb&lt;sub&gt;2&lt;/sub&gt;Te&lt;sub&gt;3&lt;/sub&gt;) Thermoelectric Devices
 
</article-title></title-group><contrib-group><contrib contrib-type="author" xlink:type="simple"><name name-style="western"><surname>Ibrahim</surname><given-names>M. Abdel-Motaleb</given-names></name><xref ref-type="aff" rid="aff1"><sup>1</sup></xref><xref ref-type="corresp" rid="cor1"><sup>*</sup></xref></contrib><contrib contrib-type="author" xlink:type="simple"><name name-style="western"><surname>Syed</surname><given-names>M. Qadri</given-names></name><xref ref-type="aff" rid="aff1"><sup>1</sup></xref></contrib></contrib-group><aff id="aff1"><addr-line>Department of Electrical Engineering, Northern Illinois University, DeKalb, IL, USA</addr-line></aff><author-notes><corresp id="cor1">* E-mail:<email>ibrahim@niu.edu(IMA)</email>;</corresp></author-notes><pub-date pub-type="epub"><day>20</day><month>07</month><year>2017</year></pub-date><volume>07</volume><issue>03</issue><fpage>63</fpage><lpage>77</lpage><history><date date-type="received"><day>May</day>	<month>23,</month>	<year>2017</year></date><date date-type="rev-recd"><day>Accepted:</day>	<month>July</month>	<year>18,</year>	</date><date date-type="accepted"><day>July</day>	<month>21,</month>	<year>2017</year></date></history><permissions><copyright-statement>&#169; Copyright  2014 by authors and Scientific Research Publishing Inc. </copyright-statement><copyright-year>2014</copyright-year><license><license-p>This work is licensed under the Creative Commons Attribution International License (CC BY). http://creativecommons.org/licenses/by/4.0/</license-p></license></permissions><abstract><p>
 
 
  We report on the fabrication and characterization of multi-leg bismuth telluride (Bi
  <sub>2</sub>Te
  <sub>3</sub>) and antimony telluride (Sb
  <sub>2</sub>Te
  <sub>3</sub>) thermoelectric devices. The two materials were deposited, on top of SiO
  <sub>2</sub>/Si substrates, using Pulsed Laser Deposition (PLD). The SiO
  <sub>2</sub> layer was used to provide insulation between the devices and the Si wafer. Copper was used as an electrical connector and a contact for the junctions. Four devices were built, where the Bi
  <sub>2</sub>Te
  <sub>3</sub> and Sb
  <sub>2</sub>Te
  <sub>3</sub> were deposited at substrate temperatures of 100
  &amp;deg;C, 200
  &amp;deg;C, 300
  &amp;deg;C and 400
  &amp;deg;C. The results show that the device has a voltage sensitivity of up to 146 
  &amp;mu;V/K and temperature sensitivity of 6.8 K/mV.
 
</p></abstract><kwd-group><kwd>Thermoelectric Devices</kwd><kwd> Bismuth Telluride</kwd><kwd> Bi2Te3</kwd><kwd> Antimony Telluride</kwd><kwd> Sb2Te3</kwd><kwd> Pulsed Laser Deposition</kwd><kwd> PLD</kwd><kwd> Seebeck Effect</kwd></kwd-group></article-meta></front><body><sec id="s1"><title>1. Introduction</title><p>Thermoelectric devices can convert heat to electrical power and vice versa. These devices can be used for many applications, such as micro-cooling and micro-heating. The devices can also be used for converting wasted heat energy from factories, plants, and automobiles to electrical power. Micro-heating and cooling and electrical current generation can be attractive for applications such as powering biomedical sensors, cooling integrated circuits, or operating microelectromechanical systems (MEMS) devices and sensors.</p><p>Thermoelectric devices can be characterized by measuring several parameters that correlate the electrical signals (current and voltage) to the temperature difference. The first parameter used to characterize materials and devices is Seebeck coefficient. This coefficient relates the difference in voltage, ΔV, to the difference in temperatures, ΔT, between two points [<xref ref-type="bibr" rid="scirp.77831-ref1">1</xref>] [<xref ref-type="bibr" rid="scirp.77831-ref2">2</xref>] . In this case, Seebeck coefficient is a characteristic of the materials. Seebeck coefficient, S, can be expressed as:</p><disp-formula id="scirp.77831-formula92"><label>(1)</label><graphic position="anchor" xlink:href="http://html.scirp.org/file/2-1520093x2.png"  xlink:type="simple"/></disp-formula><p>For a device composed of two dissimilar materials (A and B) forming two junctions at their ends, Seebeck coefficient relates ΔV and ΔT of the junctions. Hence,</p><disp-formula id="scirp.77831-formula93"><label>(2)</label><graphic position="anchor" xlink:href="http://html.scirp.org/file/2-1520093x3.png"  xlink:type="simple"/></disp-formula><p>where S<sub>A</sub> and S<sub>B</sub> are Seebeck coefficients for materials A and B, respectively. In this case, the effective Seebeck coefficient for the device is</p><disp-formula id="scirp.77831-formula94"><label>(3)</label><graphic position="anchor" xlink:href="http://html.scirp.org/file/2-1520093x4.png"  xlink:type="simple"/></disp-formula><p>To characterize the thermoelectric performance, Altenkirch found that a dimensionless figure of merit can provide a better indication of the thermoelectric quality of a material than Seebeck or Peltier effects [<xref ref-type="bibr" rid="scirp.77831-ref1">1</xref>] [<xref ref-type="bibr" rid="scirp.77831-ref2">2</xref>] [<xref ref-type="bibr" rid="scirp.77831-ref3">3</xref>] . This figure of merit, ZT, can be expressed as</p><disp-formula id="scirp.77831-formula95"><label>, (4)</label><graphic position="anchor" xlink:href="http://html.scirp.org/file/2-1520093x5.png"  xlink:type="simple"/></disp-formula><p>where σ, S, and k are the electrical conductivity, Seebeck coefficient, and thermal conductivity of the material, respectively. From Equation (3), it can be observed that a material with good thermoelectric properties should have high σ, high S, and low k.</p><p>For a device built using n-type and p-type materials, the figure of merit, ZT, can be obtained from the following Equation [<xref ref-type="bibr" rid="scirp.77831-ref1">1</xref>] :</p><disp-formula id="scirp.77831-formula96"><label>, (5)</label><graphic position="anchor" xlink:href="http://html.scirp.org/file/2-1520093x6.png"  xlink:type="simple"/></disp-formula><p>where S<sub>n</sub>, ρ<sub>n</sub>, and k<sub>n</sub> are the Seebeck coefficient, the resistivity, and the thermal conductivity of the n-type material, respectively. Similarly, S<sub>p</sub>, ρ<sub>p</sub>, and k<sub>p</sub> are the Seebeck coefficient, the resistivity, and the thermal conductivity for the p-type material, respectively. As indicated by Equation (3), for thermoelectric devices, the Seebeck coefficient of the device is<inline-formula><inline-graphic xlink:href="http://html.scirp.org/file/2-1520093x7.png" xlink:type="simple"/></inline-formula>.</p><p>There are many different materials that can be used to build thermoelectric devices. Chalcogenides group is one type of these thermoelectric materials. They are materials that contain one or more elements such as S, Se or Te as a substantial constituent, such as CsBi<sub>4</sub>Te<sub>6</sub>, Tl<sub>2</sub>SnTe<sub>5</sub> and Tl<sub>2</sub>GeTe<sub>5</sub>, PbTe, and ZfTe<sub>5</sub> [<xref ref-type="bibr" rid="scirp.77831-ref4">4</xref>] [<xref ref-type="bibr" rid="scirp.77831-ref5">5</xref>] [<xref ref-type="bibr" rid="scirp.77831-ref6">6</xref>] [<xref ref-type="bibr" rid="scirp.77831-ref7">7</xref>] . Skutterudites, such as (Ce<sub>y</sub>Fe<sub>1−y</sub>)<sub>x</sub>Co<sub>4−x</sub>, form<sub> </sub>another set of materials. It was reported that this material has a figure of merit of 1.4 at 1000 K [<xref ref-type="bibr" rid="scirp.77831-ref1">1</xref>] . Half Heusler alloys, such as Zr<sub>0.5</sub>Hf<sub>0.5</sub>NiSb<sub>x</sub>Sn<sub>1−x</sub>, were investigated and found to have S = 10 &#181;/K, at 50 K [<xref ref-type="bibr" rid="scirp.77831-ref8">8</xref>] . Clathrates materials, such as Eu<sub>8</sub>Ga<sub>16</sub>Ge<sub>30</sub> and Sr<sub>8</sub>Ga<sub>16</sub>Ge<sub>30</sub>, were found to have low thermal conductivity, which results in high figure of merit [<xref ref-type="bibr" rid="scirp.77831-ref9">9</xref>] [<xref ref-type="bibr" rid="scirp.77831-ref10">10</xref>] . Alloys of Te-Ag-Ge-Sb, which is referred to as TAGS, can provide ZT &gt; 1 [<xref ref-type="bibr" rid="scirp.77831-ref11">11</xref>] [<xref ref-type="bibr" rid="scirp.77831-ref12">12</xref>] . Ca<sub>3</sub>Co<sub>4</sub>O<sub>9</sub> and single-crystal NaCo<sub>2</sub>O<sub>4</sub> achieved Seebeck coefficient value of 130 and 100 μV/K, respectively [<xref ref-type="bibr" rid="scirp.77831-ref13">13</xref>] [<xref ref-type="bibr" rid="scirp.77831-ref14">14</xref>] .</p><p>One of the most promising materials for thermoelectric application is Bismuth telluride (Bi<sub>2</sub>Te<sub>3</sub>) and Antimony telluride (Sb<sub>2</sub>Te<sub>3</sub>) [<xref ref-type="bibr" rid="scirp.77831-ref15">15</xref>] . Bi<sub>2</sub>Te<sub>3</sub> is a natural n-type material while Sb<sub>2</sub>Te<sub>3</sub> is a natural p-type material [<xref ref-type="bibr" rid="scirp.77831-ref16">16</xref>] . These materials can be grown using many growth techniques such as Chemical Vapor Epitaxy (CVD), sputtering, Molecular Beam Epitaxy (MBE), among other techniques. Shaik and Abdel-Motaleb have grown Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> using Pulsed Laser Deposition (PLD) technique [<xref ref-type="bibr" rid="scirp.77831-ref17">17</xref>] . They have also investigated their electrical and optical characteristics [<xref ref-type="bibr" rid="scirp.77831-ref18">18</xref>] [<xref ref-type="bibr" rid="scirp.77831-ref19">19</xref>] . They have shown that good quality of polycrystalline materials of Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> can be grown using PLD.</p><p>In this paper, we designed and fabricated thermoelectric devices using PLD- grown 4-pair legs of n-Bi<sub>2</sub>Te<sub>3</sub> and p-Sb<sub>2</sub>Te<sub>3</sub>. The thermoelectric properties of the materials and the devices are investigated. To the best of our knowledge, there is very few published report about the fabrication of a multi-leg, PLD-grown Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> thermoelectric devices. In fact, we could not identify one credible report. Therefore, we believe that this study will advance the state of the art of this area.</p></sec><sec id="s2"><title>2. Device Design</title><p>The thermoelectric device consists of an n-type and a p-type material connected electrically in series and thermally in parallel. The materials used in this device are n-type Bi<sub>2</sub>Te<sub>3</sub> and p-type Sb<sub>2</sub>Te<sub>3</sub>, with copper acting as the metal contact between the two materials. The devices were built on a 3-inch p-Si wafer, with 3000˚A of thermally grown SiO<sub>2</sub> on top [<xref ref-type="bibr" rid="scirp.77831-ref20">20</xref>] . The SiO<sub>2</sub> is used just for isolating the devices from the p-Si wafer. The dimensions of each area of the Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> are 0.4 inch &#215; 0.12 inch. Both materials have 8 regions connected with copper contacts as shown in <xref ref-type="fig" rid="fig1"><xref ref-type="fig" rid="fig">Figure </xref>1</xref>(a). In this figure, the red is Bi<sub>2</sub>Te<sub>3</sub>, the blue</p><fig id="fig1"  position="float"><label><xref ref-type="fig" rid="fig1"><xref ref-type="fig" rid="fig">Figure </xref>1</xref></label><caption><title> The thermoelectric device. (a) The masks for the tree layers: the red is for the Bi<sub>2</sub>Te<sub>3</sub>, the blue is for Sb<sub>2</sub>Te<sub>3</sub>, and the green is for the copper metal. (b) A photograph of the device after fabrication</title></caption><graphic mimetype="image"   position="float"  xlink:type="simple"  xlink:href="http://html.scirp.org/file/2-1520093x8.png"/></fig><p>is for Sb<sub>2</sub>Te<sub>3</sub> and the green color depicts and copper metal. The dimensions for the copper are roughly 0.34 inches &#215; 0.12 inches.</p><p>Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> were grown using the PLD technique. The copper connections were deposited using the electron beam evaporation technique. Three different shadow masks for Bi<sub>2</sub>Te<sub>3</sub>, Sb<sub>2</sub>Te<sub>3</sub> and the copper were designed and manufactured for the use in building the devices; see <xref ref-type="fig" rid="fig1"><xref ref-type="fig" rid="fig">Figure </xref>1</xref>(a). The finished thermoelectric device is shown in <xref ref-type="fig" rid="fig1"><xref ref-type="fig" rid="fig">Figure </xref>1</xref>(b).</p></sec><sec id="s3"><title>3. Material Deposition</title><p>Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> were deposited using Neocera-PLD system [<xref ref-type="bibr" rid="scirp.77831-ref21">21</xref>] . After loading the substrate and mounting the targets for the two materials, the turbo pump was turned on to reduce the pressure to the level of 10<sup>−6</sup> Torr. The substrate temperature was maintained to the set value using a 3-inch heater. The heater is capable of reaching a maximum temperature of 850˚C. The deposition of Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> was carried out in Argon atmosphere. In this study, four devices were fabricated by depositing these materials at substrate temperatures of 100˚C, 200˚C, 300˚C, and 400˚C. The deposition targets used in the PLD system are 99.999% pure hot pressed Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> with a diameter of 1-inch and a thickness of 0.125-inch each.</p><p>After the chamber was pumped down to about 5 &#215; 10<sup>−6</sup> Torr, Ar gas was admitted to increase the chamber pressure to the desired deposition pressure of 7.5 mTorr. The substrate temperature increased from room temperature to the required temperature by ramping the heater at 10˚C/minute. KrF laser was applied to the target for 2 hours for a total of 72,000 pulses. The laser beam parameters were set to the following values: incident angle equal 45˚, frequency equal 10 Hz, and energy equal 250 mJ. The targets were set to rotate during the deposition in order to reduce exfoliation.</p><p>For each device, both Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> were deposited at the same substrate temperature. During the deposition, the substrate was covered with its respective shadow mask to form the desired device geometry. Copper metal contacts were deposited using the electron beam evaporation technique and patterned using the shadow mask designed for this purpose.</p></sec><sec id="s4"><title>4. Material Characterization</title><p>Dektak profilometer was used to measure the thickness of the deposited films. With a vertical resolution of ~5 A. The average thickness was found to be 400 &#181;m for all films, as intended.</p><p>The surface morphology of Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> films were characterized using HITACHI S-4500 Scanning Electron Microscope (SEM). The SEM images of the device were obtained by firing the electron beam at 3 kV. Images with magnification of 2.5 K were taken for Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> films deposited at the different deposition temperature, as shown in <xref ref-type="fig" rid="fig2"><xref ref-type="fig" rid="fig">Figure </xref>2</xref> and <xref ref-type="fig" rid="fig3"><xref ref-type="fig" rid="fig">Figure </xref>3</xref>.</p><p>Bi<sub>2</sub>Te<sub>3</sub> deposited at 100˚C was found to be rough with irregular formation of</p><fig id="fig2"  position="float"><label><xref ref-type="fig" rid="fig2"><xref ref-type="fig" rid="fig">Figure </xref>2</xref></label><caption><title> SEM images of Bi<sub>2</sub>Te<sub>3</sub> films with magnification of 2.5 K for films deposited at substrate temperature of (a) 100˚C (b) 200˚C (c) 300˚C (d) 400˚C</title></caption><graphic mimetype="image"   position="float"  xlink:type="simple"  xlink:href="http://html.scirp.org/file/2-1520093x9.png"/></fig><p>grains. The films deposited at 200˚C were found to have smoother surfaces compared to other films. For the higher temperature substrates, Bi<sub>2</sub>Te<sub>3</sub> surfaces became rough again with large sizes of island structures. The roughness can be attributed to the high substrate temperatures that caused the grains to over grow and induce roughness [<xref ref-type="bibr" rid="scirp.77831-ref2">2</xref>] . Over growth could be due to the combination of small grains to from lager grains, by a process called secondary recrystallization [<xref ref-type="bibr" rid="scirp.77831-ref16">16</xref>] . However, for Sb<sub>2</sub>Te<sub>3</sub> films, we found that there was not much difference seen between films deposited at 200˚C and 300˚C.</p></sec><sec id="s5"><title>5. Measurement of Effective Seebeck Coefficient or Voltage Sensitivity</title><p>To obtain the effective Seebeck coefficient for a device, Seebeck coefficients for the constituent materials (Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub>) should be known first. The effective Seebeck coefficient for the device can then be calculated from Equation (3). Another way to obtain the effective Seebeck coefficient for the entire device is to measure it experimentally. This requires that both voltage and temperature differences be measured across the device junction. In our case, we do not have a</p><fig id="fig3"  position="float"><label><xref ref-type="fig" rid="fig3"><xref ref-type="fig" rid="fig">Figure </xref>3</xref></label><caption><title> SEM images of Sb<sub>2</sub>Te<sub>3</sub> films with magnification of 2.5 K for films deposited at substrate temperature of (a) 100˚C (b) 200˚C (c) 300˚C (d) 400˚C</title></caption><graphic mimetype="image"   position="float"  xlink:type="simple"  xlink:href="http://html.scirp.org/file/2-1520093x10.png"/></fig><p>simple one junction device, but rather a more complicated multi-leg device, which requires a more elaborate technique.</p><p>In our case, the effective Seebeck coefficient was measured by applying a voltage across points 1 and 2 and measuring the temperature difference between points 3 and 4. Points 1, 2, 3, and 4 are indicated in <xref ref-type="fig" rid="fig1"><xref ref-type="fig" rid="fig">Figure </xref>1</xref>(a). It should be noted that points 1 and 2 are chosen for voltage application because they are the input ports of the device, where the legs are electrically connected in series. On the other hand the temperature difference was measured across junctions 3 and 4. It should be noted that the temperature difference can be measured across any two junctions, and this would still represent the temperature difference across the entire device. This is true because the device legs are thermally connected in parallel, and the temperature difference across any junctions is the same.</p><p>In our case, the voltage was supplied using a high precision voltage supply and measured using high resolution voltmeter. The temperature difference, ΔT, was measured using SA1-K (Chromega-Alomega) type thermocouple. This thermocouple can measure temperatures from −60˚C to 175˚C continuously with a time response of 0.3 seconds. This thermocouple has a silicon based cement adhesive attached to a polyimide adhesive pad. Two thermocouples were used for measuring the temperature across the junctions. One lead of the thermocouple was attached to junction 3 using the adhesive pad, while the other lead was connected to the thermal read out using a connector. After applying the desired voltage across points 1 and 2, the temperature of junction 3 was measured from the reading of the thermal read out. Similarly the temperature of junction 4 was measured using the other thermocouple. The difference between the readings of the two thermal readouts gave the temperature difference across junctions, 3 and 4.</p><p>As shown in <xref ref-type="fig" rid="fig4"><xref ref-type="fig" rid="fig">Figure </xref>4</xref>, the device with a material deposition temperature of 100˚C has temperature difference (ΔT) varied from 0 to 3 K for an applied voltage from 0 to 0.25 mV. The temperature difference remained almost constant when the voltage increased beyond this value. This may be due to the heat loss, resulting from thermal leakage to the substrate and radiation to the surroundings. This may also be due to the fact that none of the junctions were maintained at constant room temperature using a heat sink. As a result, the temperatures at</p><fig id="fig4"  position="float"><label><xref ref-type="fig" rid="fig4"><xref ref-type="fig" rid="fig">Figure </xref>4</xref></label><caption><title> Temperature difference between the junctions when voltage is applied at the terminals of device with substrate temperatures of (a) 100˚C (b) 200˚C (c) 300˚C (d) 400˚C</title></caption><graphic mimetype="image"   position="float"  xlink:type="simple"  xlink:href="http://html.scirp.org/file/2-1520093x11.png"/></fig><p>both the junctions changed simultaneously reducing the temperature difference between the junctions. However, this effect would not be prominent, if the applied voltage is kept low. For this reason, the applied voltage was maintained at low values to ensure accurate results.</p><p>For the device built with material deposition temperature of 200˚C, ΔT increased to 3.5 K when a voltage of 0.41 mV was applied. For the device built at 300˚C, ΔT increased to 4.5 K when a voltage of 0.61 mV was applied. Finally for the device deposited at 400˚C, ΔT increased to 4.5 K when 0.55 mV was applied at the terminals 1 and 2. Similar to the first device, no further increase in ΔT was observed when the voltages were increased beyond these values.</p><p>The ratio of the voltage applied to the temperature difference gives the effective Seebeck coefficient for the device, or. This ratio is the slope of the graph in <xref ref-type="fig" rid="fig4"><xref ref-type="fig" rid="fig">Figure </xref>4</xref>. From this Figure, it can be shown that the effective Seebeck coefficients are 93 μV/K, 100 μV/K, 146 μV/K and 132 μV/K for the devices with deposition temperatures of 100˚C, 200˚C, 300˚C and 400˚C, respectively. It was observed that the effective Seebeck coefficient increases with the increase of the substrate temperature, reaching a maxima at 300˚C, then decreases after that. The increase could be due to the decrease in the thermal conductivity of the materials at high deposition temperatures [<xref ref-type="bibr" rid="scirp.77831-ref22">22</xref>] . The subsequent decrease could be due to the excessive increase in the resistivity of Bi<sub>2</sub>Te<sub>3</sub> which leads to the increase of the voltage drop outside the junction, reducing the effective ΔV. Kimi and Oh reported the fabrication of electrodeposited 196 pairs of Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> thin film legs thermopile [<xref ref-type="bibr" rid="scirp.77831-ref23">23</xref>] . They controlled the temperature difference of the thermopile and measured the voltage difference. When the temperature difference was set to 14˚C, a maximum sensitivity of 57.5 mV/K was obtained. This high value of the voltage sensitivity is attributed to the large number of pairs of legs and the size of device layers.</p></sec><sec id="s6"><title>6. Thermal Conductivity</title><p>There are various methods used for the measurement of thermal conductivity of thin films. Among these methods are the thermal conductance, thermal diffusive, thermos-reflectance, the laser flash, and the 3ω method [<xref ref-type="bibr" rid="scirp.77831-ref24">24</xref>] [<xref ref-type="bibr" rid="scirp.77831-ref25">25</xref>] . In this work, the thermal conductivity values were taken from the literatures [<xref ref-type="bibr" rid="scirp.77831-ref24">24</xref>] [<xref ref-type="bibr" rid="scirp.77831-ref26">26</xref>] . The thermal conductivity for Bi<sub>2</sub>Te<sub>3</sub> for different growth temperatures are shown in <xref ref-type="table" rid="table1">Table 1</xref>. For Sb<sub>2</sub>Te<sub>3</sub>, thermal conductivity values for PLD-grown films at the</p><table-wrap id="table1" ><label><xref ref-type="table" rid="table1">Table 1</xref></label><caption><title> Thermal conductivity values of Bi<sub>2</sub>Te<sub>3</sub></title></caption><table><tbody><thead><tr><th align="center" valign="middle" >Substrate temperature</th><th align="center" valign="middle" >Thermal conductivity of Bi<sub>2</sub>Te<sub>3</sub> (Wm<sup>−1</sup>・K<sup>−1</sup>) [<xref ref-type="bibr" rid="scirp.77831-ref24">24</xref>] [<xref ref-type="bibr" rid="scirp.77831-ref26">26</xref>] <sub> </sub></th><th align="center" valign="middle" >Resistivity of Bi<sub>2</sub>Te<sub>3</sub> (&#181;Ω・m) (This work)</th><th align="center" valign="middle" >Resistivity of Sb<sub>2</sub>Te<sub>3</sub> (&#181;Ω・m) (This work)</th></tr></thead><tr><td align="center" valign="middle" >100˚C</td><td align="center" valign="middle" >1.75</td><td align="center" valign="middle" >40</td><td align="center" valign="middle" >24</td></tr><tr><td align="center" valign="middle" >200˚C</td><td align="center" valign="middle" >1.5</td><td align="center" valign="middle" >44</td><td align="center" valign="middle" >17.68</td></tr><tr><td align="center" valign="middle" >300˚C</td><td align="center" valign="middle" >0.9</td><td align="center" valign="middle" >68</td><td align="center" valign="middle" >16</td></tr><tr><td align="center" valign="middle" >400˚C</td><td align="center" valign="middle" >0.8</td><td align="center" valign="middle" >84</td><td align="center" valign="middle" >15</td></tr></tbody></table></table-wrap><p>same growth temperatures are hard to find in the literature. Therefore, an average value of thermal conductivity of 1.63 Wm<sup>−1</sup>・K<sup>−1</sup> was used for all films of Sb<sub>2</sub>Te<sub>3</sub> [<xref ref-type="bibr" rid="scirp.77831-ref27">27</xref>] .</p></sec><sec id="s7"><title>7. Electrical Conductivity</title><p>The measured electrical parameters of Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> films, obtained using the four point probe technique, are shown in Figures 5(a)-(c). The <xref ref-type="fig" rid="fig">Figure </xref>shows</p><fig id="fig5"  position="float"><label><xref ref-type="fig" rid="fig">Figure </xref>5</label><caption><title> Electrical Parameters for Bi<sub>2</sub>Te<sub>3</sub> (a) Sheet Resistance (b) Resistivity (c) Electrical conductivity with temperature. Electrical Parameters for Sb<sub>2</sub>Te<sub>3</sub> (d) Sheet Resistance (e) Resistivity (f) Electrical conductivity with temperature</title></caption><graphic mimetype="image"   position="float"  xlink:type="simple"  xlink:href="http://html.scirp.org/file/2-1520093x12.png"/></fig><p>the effect of substrate temperature on the sheet resistance, resistivity and the electrical conductivity. The value of the sheet resistance for Bi<sub>2</sub>Te<sub>3</sub> was found to increase with the substrate temperature, with a maximum value of 210 (Ω/□) at 400˚C. When the substrate temperature increases, grains over grow resulting in increasing the roughness and irregularities in the film. This results in increasing the sheet resistance of the film. This increase may be due to carrier scattering at the rough boundaries of the grains, which increases with the growth temperature [<xref ref-type="bibr" rid="scirp.77831-ref18">18</xref>] . Consequently, the resistivity increases and the conductivity decreases with increasing the substrate temperature. These findings have also been observed in references [<xref ref-type="bibr" rid="scirp.77831-ref18">18</xref>] [<xref ref-type="bibr" rid="scirp.77831-ref28">28</xref>] .</p><p>The sheet resistance was measured for Sb<sub>2</sub>Te<sub>3</sub> films using the four point probe too. The measured values of the sheet resistance, resistivity and the electrical conductivity, as a function of the substrate growth temperature, are shown in Figures 5(d)-(f). As shown in the Figure, the resistivity of the films, and consequently the sheet resistance, changes only by about &#177;15% from the average value. Therefore, the sheet resistance and resistivity can be assumed to be almost constant with temperature, even though they have decreasing values. The conductivity will behave accordingly.</p><p>The resistivity of Sb<sub>2</sub>Te<sub>3</sub> films behaves differently from Bi<sub>2</sub>Te<sub>3</sub> films, where the resistivity remains almost constant with growth temperature. This behavior can be attributed to the finding that the grain size of PLD-grown Sb<sub>2</sub>Te<sub>3</sub> films does not change with the temperature growth. Hence the level of scattering of the carriers at the grain boundaries is the same for all samples. The same behavior has been observed and reported by in references [<xref ref-type="bibr" rid="scirp.77831-ref18">18</xref>] [<xref ref-type="bibr" rid="scirp.77831-ref29">29</xref>] .</p></sec><sec id="s8"><title>8. <xref ref-type="fig" rid="fig">Figure </xref>of Merit and Power Factor</title><p>To the best of our knowledge there is no published report on the figure of merit of multi-leg devices built using PLD-grown Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub>. However, there are reports of calculated figure of merit when the material thin film is used individually to build the device.</p><p>The figure of merit of one pair of p-n legs thermoelectric device can be calculated using Equation (5). The values of the device effective Seebeck coefficient (voltage sensitivity) and Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> electrical resistivity and thermal conductivity are obtained from Sections 5, 6, and 7 above. The Seebeck values measured are for the entire 4-pair legs device. Since these devices are electrically connected in series, the Seebeck coefficient of one pair of Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> leg is 25% of the measured value. These values are used in our calculation of the <xref ref-type="fig" rid="fig">Figure </xref>of Merit (ZT) and the Power Factor (PF), shown in <xref ref-type="table" rid="table2">Table 2</xref>. The power factor (PF) measures the performance of the device and can be obtained from the equation PF = S<sup>2</sup>σ. When calculating the PF, the effective resistivity of the two materials becomes r = r<sub>n</sub> + r<sub>p</sub> and the effective thermal conductivity becomes k = k<sub>n</sub> + k<sub>p</sub>, since the dimensions of the n region is the same as those of the p-region [<xref ref-type="bibr" rid="scirp.77831-ref30">30</xref>] .</p><table-wrap id="table2" ><label><xref ref-type="table" rid="table2">Table 2</xref></label><caption><title> Performance parameters at different temperatures</title></caption><table><tbody><thead><tr><th align="center" valign="middle" >Substrate temperature (˚C)</th><th align="center" valign="middle" >Device effective seebeck coefficient (Voltage sensitivity) (μV/K)</th><th align="center" valign="middle" >Effective electrical resistivity for one pair, r (&#181;Ω・m)</th><th align="center" valign="middle" >Effective thermal conductivity for one pair, k (Wm<sup>−1</sup>・K<sup>−1</sup>)</th><th align="center" valign="middle" ><xref ref-type="fig" rid="fig">Figure </xref>of merit (ZT) measurements at room temperature for one pair</th><th align="center" valign="middle" >Power factor for one pair PF = S<sup>2</sup>・σ (&#181;W/K<sup>2</sup>・m)</th></tr></thead><tr><td align="center" valign="middle" >100</td><td align="center" valign="middle" >93</td><td align="center" valign="middle" >84<sup> </sup></td><td align="center" valign="middle" >3.38</td><td align="center" valign="middle" >7.586 &#215; 10<sup>−4</sup></td><td align="center" valign="middle" >8.446</td></tr><tr><td align="center" valign="middle" >200</td><td align="center" valign="middle" >100</td><td align="center" valign="middle" >61.68<sup> </sup></td><td align="center" valign="middle" >3.13</td><td align="center" valign="middle" >0.001</td><td align="center" valign="middle" >10.133</td></tr><tr><td align="center" valign="middle" >300</td><td align="center" valign="middle" >146</td><td align="center" valign="middle" >84<sup> </sup></td><td align="center" valign="middle" >2.53</td><td align="center" valign="middle" >0.003</td><td align="center" valign="middle" >20.816</td></tr><tr><td align="center" valign="middle" >400</td><td align="center" valign="middle" >132</td><td align="center" valign="middle" >101<sup> </sup></td><td align="center" valign="middle" >2.43</td><td align="center" valign="middle" >0.002</td><td align="center" valign="middle" >10.96</td></tr></tbody></table></table-wrap><p><xref ref-type="table" rid="table2">Table 2</xref> shows the values of ZT and the PF of one pair of legs deposited at different growth temperatures. The two parameters for the device were calculated at room temperature. It can be observed that the figure of merit increases for the substrate temperature until 300˚C and then it decreases for the device with a substrate temperature of 400˚C. The power factor behaves exactly the same way. For devices with growth temperatures at 100˚C, 200˚C and 300˚C, the thermal conductivity of the device was found to decrease with temperature and this is accompanied by an increase in the effective Seebeck coefficient, which results in the increase in the figure of merit and the power factor of the device. The decrease for device built at 400˚C can be attributed to the slight decrease in the electrical conductivity and the effective Seebeck coefficient at that temperature.</p><p>The performance of our devices can be enhanced if more pairs of legs are used. Kimi and Oh reported the fabrication of 196 pairs of Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> thin film legs thermopile using electrodeposition [<xref ref-type="bibr" rid="scirp.77831-ref23">23</xref>] . They reported a voltage sensitivity from 57.5 mV/K for the entire device. However by dividing the reported sensitivity value by 196 (the number of pairs of legs), the value is reduced to 293 &#181;V/K. Our voltage sensitivity values have been affected by the fact that the device was not thermally isolated and without a heat sink. This resulted in the loss of heat due to radiation and thermal conductivity. Our simulation shows that by using a heat sink, the voltage sensitivity will increase by 25% - 200% [<xref ref-type="bibr" rid="scirp.77831-ref31">31</xref>] .</p><p>Using Seebeck coefficient or voltage sensitivity for all types of thermoelectric devices may not provide an accurate evaluation of the performance of some types of devices. This because a device designed for cooling is different from that built for energy harvesting. The optimum parameters for one type may not be the optimum for another type. Similar to an amplifier, the characteristics for a common base configuration is different from a common emitter configuration. One has high current gain but low voltage gain and the other has higher gain for both.</p><p>The devices reported here use politer effect, not Seebeck effect. The input to our device is voltage and the output is temperature difference. Hence the device sensitivity should be temperature sensitivity ΔT/ΔV, not voltage sensitivity, which is related to Seebeck Coefficient. To differentiate between the two parameters, let us call the voltage sensitivity S<sub>V</sub> and the temperature sensitivity S<sub>T</sub>. Let us now compare the device reported in [<xref ref-type="bibr" rid="scirp.77831-ref23">23</xref>] by Kimi and Oh, with our device. For our device the highest value for S<sub>V</sub> is 146 &#181;V/K for the 4 pairs of legs device fabricated at 300˚C. This means for one leg, S<sub>V</sub> = 36.5 &#181;V/K. For Kimi and Oh device the maximum S<sub>V</sub> = 57.5 mV/K for 196 pairs. This means for a pair of legs, S<sub>V</sub> = 293 &#181;V/K, which is higher than our device. However, if we compare the temperature sensitivity for one pair, we will find that our device has S<sub>T</sub> = 27.4 K/mV compared with Kimi and Oh device, where S<sub>T</sub> = 3.4 K/mV. This means our device is geared to obtain higher temperature sensitivity, since it is used for cooling/heating based on politer effect. On the other hand, Kimi and Oh device is geared for energy harvesting, hence it should have higher voltage sensitivity. Temperature sensitivity can be obtained from the voltage sensitivity where S<sub>T</sub> = 1/S<sub>V</sub>.</p></sec><sec id="s9"><title>9. Conclusions</title><p>In conclusion, we report on the design and fabrication of thermoelectric devices composed of 4-pairs of legs of PLD grown n-Bi<sub>2</sub>Te<sub>3</sub> and p-Sb<sub>2</sub>Te<sub>3</sub> thin films. Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> are simple compounds, easy to synthesize and deposit, have very high conductivity, and are naturally doped. These advantages make the cost of building devices much lower than the more complex alloys.</p><p>Our study shows that these multi-leg devices have the performance that makes them attractive for cooling/heating devices. However, these devices can even provide much higher performance, if the geometry and fabrication process are optimized to serve the application targeted. The devices fabricated achieved a maximum effective Seebeck coefficient of 146 μV/K, a figure of merit of 0.03, and a power factor of 20.8 &#181;W/m・K<sup>2</sup>.</p><p>Although the convention is to use Seebeck coefficient, the power factor, and the figure of merit to characterize any device, we believe that such parameters should not be used universally for all thermoelectric devices. The performance of a device used for energy harvesting, can be evaluated using the voltage sensitivity, S<sub>V</sub> = ΔV/ΔT. However, devices used for cooling/heating application should use temperature sensitivity S<sub>T</sub> = ΔT/ΔV, instead. Since the reported devices are designed for cooling/heating applications, temperature sensitivity represents the best indication of the device performance. For one pair of legs, our device exhibited a max S<sub>T</sub> of 27.4 K/mV compared with 3.4 K/mV for the device reported by Kimi and Oh. However, our devices have lower voltage sensitivity of 36.5 μV/K compared with 293 μV/K for the device of Kimi and Oh for one pair of legs. These results support our claim that cooling and heating devices, such as ours, should be optimized to achieve higher temperature sensitivity, while energy harvesting devices should be optimized to obtain higher voltage sensitivity.</p><p>The performance of this device can be enhanced several fold, if superlattice layers are used [<xref ref-type="bibr" rid="scirp.77831-ref32">32</xref>] . The enhancement in these materials is mainly attributed to the controlling of the transport of phonons and photons in the super lattice. In order to understand and confirm the results obtained by this study, a theoretical study, such as multi-physics numerical analysis, may need to be conducted [<xref ref-type="bibr" rid="scirp.77831-ref31">31</xref>] .</p></sec><sec id="s10"><title>Acknowledgements</title><p>The authors would like to acknowledge Northern Illinois University and its Microelectronic Research and Development Laboratory (MRDL) for supporting this work.</p></sec><sec id="s11"><title>Cite this paper</title><p>Abdel-Motaleb, I.M. and Qadri, S.M. (2017) Fabrication and Characterization of PLD-Grown Bismuth Telluride (Bi<sub>2</sub>Te<sub>3</sub>) and Antimony Telluride (Sb<sub>2</sub>Te<sub>3</sub>) Thermoelectric Devices. Journal of Electronics Cooling and Thermal Control, 7, 63-77. https://doi.org/10.4236/jectc.2017.73006</p></sec></body><back><ref-list><title>References</title><ref id="scirp.77831-ref1"><label>1</label><mixed-citation publication-type="other" xlink:type="simple">Willfahart, A. (2014) Screen Printed Thermoelectric Devices. Link&amp;ouml;pings Universitet, SE-60174 Norrk&amp;ouml;ping.</mixed-citation></ref><ref id="scirp.77831-ref2"><label>2</label><mixed-citation publication-type="other" xlink:type="simple">Tritt, T.M. (2002) Thermoelectric Materials: Principles, Structure, Properties, and Applications. Encyclopedia of Materials: Science and Technology, 1-11.</mixed-citation></ref><ref id="scirp.77831-ref3"><label>3</label><mixed-citation publication-type="other" xlink:type="simple">Nolas, G.S., Sharp, J. and Goldsmid, J. (2001) Thermoelectrics: Basic Principles and New Materials Developments. Springer, New York City. https://doi.org/10.1007/978-3-662-04569-5</mixed-citation></ref><ref id="scirp.77831-ref4"><label>4</label><mixed-citation publication-type="other" xlink:type="simple">Chung, D.-Y., et al. (2000) CsBi4Te6: A High-Performance Thermoelectric Material for Low-Temperature Applications. Science, 287, 1024-1027. https://doi.org/10.1126/science.287.5455.1024</mixed-citation></ref><ref id="scirp.77831-ref5"><label>5</label><mixed-citation publication-type="other" xlink:type="simple">Sharp, J.W., Sales, B.C., Mandrus, D.G. and Chakoumakos, B.C. (1999) Thermoelectric Properties of Tl2SnTe5 and Tl2GeTe5. Applied Physics Letters, 74, 21.</mixed-citation></ref><ref id="scirp.77831-ref6"><label>6</label><mixed-citation publication-type="other" xlink:type="simple">Dughaish, Z.H. (2002) Lead Telluride as a Thermoelectric Material for Thermoelectric Power Generation. Physica B: Condensed Matter, 322, 205-223. https://doi.org/10.1016/S0921-4526(02)01187-0</mixed-citation></ref><ref id="scirp.77831-ref7"><label>7</label><mixed-citation publication-type="other" xlink:type="simple">Littleton IV, R.T., Tritt, T.M., Korzenski, M., Ketchum, D. and Kolis, J.W. (2001) Effect of Sb Substitution on the Thermoelectric Properties of the Group IV Pentatelluride Materials M1xYxTe5 (M1/4Hf, Zr and Ti). Physical Review B, 64, 121104-121107.</mixed-citation></ref><ref id="scirp.77831-ref8"><label>8</label><mixed-citation publication-type="other" xlink:type="simple">Uher, C., Yang, J., Hu, S., Morelli, D.T. and Meisner, G.P. (1999) Transport Properties of Pure and Doped MNiSn, M= (Zr, Hf). Physical Review B, 59, 8615-8621.</mixed-citation></ref><ref id="scirp.77831-ref9"><label>9</label><mixed-citation publication-type="other" xlink:type="simple">Nolas, G.S., Cohn, J.L., Slack, G.A. and Schujman, S.B. (1998) Semiconducting Ge Clathrates: Promising Candidates for Thermoelectric Applications. Applied Physics Letters, 73. https://doi.org/10.1063/1.121747</mixed-citation></ref><ref id="scirp.77831-ref10"><label>10</label><mixed-citation publication-type="other" xlink:type="simple">Meng, J.F., Chandra Shekar, N.V., Badding, J.V. and Nolas, G.S. (2001) Threefold Enhancement of the Thermoelectric Figure of Merit for Pressure Tuned Sr8Ga16Ge30. Journal of Applied Physics, 89.</mixed-citation></ref><ref id="scirp.77831-ref11"><label>11</label><mixed-citation publication-type="other" xlink:type="simple">Snyder, G.J. and Toberer, E.S. (2008) Complex Thermoelectric Materials. Nature Materials, 7, 105-114. https://doi.org/10.1038/nmat2090</mixed-citation></ref><ref id="scirp.77831-ref12"><label>12</label><mixed-citation publication-type="other" xlink:type="simple">Levin, E.M., Bud’ko, S.L. and Schmidt-Rohr, K. (2012) Enhancement of Thermopower of TAGS-85 High-Performance Thermoelectric Material by Doping with the Rare Earth Dy. Advanced Functional Materials, 22, 2766-2774. https://doi.org/10.1002/adfm.201103049</mixed-citation></ref><ref id="scirp.77831-ref13"><label>13</label><mixed-citation publication-type="other" xlink:type="simple">Hu, Y.F., Sutter, E., Si, W.D. and Li, Q. (2005) Thermoelectric Properties and Microstructure of C-Axis-Oriented Ca3Co4O9 Thin Films on Glass Substrates. Applied Physics Letters, 87, Article ID: 171912. https://doi.org/10.1063/1.2117615</mixed-citation></ref><ref id="scirp.77831-ref14"><label>14</label><mixed-citation publication-type="other" xlink:type="simple">Terasaki, I., Sasago, Y. and Uchinokura, K. (1997) Large Thermoelectric Power in NaCo2O4 Single Crystals. Physical Review B, Third Series, 56, R12685-R12687.</mixed-citation></ref><ref id="scirp.77831-ref15"><label>15</label><mixed-citation publication-type="book" xlink:type="simple">Skrabek, E.A. and Trimmer, D.S. (1995) Properties of the General TAGS System. In: Rowe, D.M., Ed., CRC Handbook of Thermoelectrics, CRC, Boca Raton, 267-275.</mixed-citation></ref><ref id="scirp.77831-ref16"><label>16</label><mixed-citation publication-type="other" xlink:type="simple">Shaikh, M. (2012) Structural, Electrical and Optical Characterization of Bismuth Telluride and Antimony Telluride Thin Films Deposited by Pulsed Laser Deposition. Graduate Thesis, CEET, Northern Illinois University.</mixed-citation></ref><ref id="scirp.77831-ref17"><label>17</label><mixed-citation publication-type="other" xlink:type="simple">Shaik, M. and Abdel-Motaleb, I.M. (2013) Effect of Substrate Temperature on PLD Grown Thin Film Bi2Te3 and Sb2Te3. IEEE EIT Conference Proceedings, Rapid City, 8-11 May 2013.</mixed-citation></ref><ref id="scirp.77831-ref18"><label>18</label><mixed-citation publication-type="other" xlink:type="simple">Shaik, M. and Abdel-Motaleb, I.M. (2013) Investigation of the Electrical Properties of PLD Grown Thin Film Bi2Te3 and Sb2Te3. IEEE EIT Conference Proceedings, Rapid City, 8-11 May 2013.</mixed-citation></ref><ref id="scirp.77831-ref19"><label>19</label><mixed-citation publication-type="other" xlink:type="simple">Shaik, M. and Abdel-Motaleb, I.M. (2013) Investigation of the Optical Properties of PLD Grown Thin Film Bi2Te3 and Sb2Te3. IEEE EIT Conference Proceedings, Rapid City, 8-11 May 2013.</mixed-citation></ref><ref id="scirp.77831-ref20"><label>20</label><mixed-citation publication-type="other" xlink:type="simple">Zhang, C. and Najafi, K. (2004) Fabrication of Thick Silicon Dioxide Layers for Thermal Isolation. Journal of Micromechanics and Microengineering, 14, 769-774. https://doi.org/10.1088/0960-1317/14/6/002</mixed-citation></ref><ref id="scirp.77831-ref21"><label>21</label><mixed-citation publication-type="other" xlink:type="simple">Brochure for PLD System. http://www.Neocera.com</mixed-citation></ref><ref id="scirp.77831-ref22"><label>22</label><mixed-citation publication-type="other" xlink:type="simple">Termentzidis, K., Pokropivny, A., Woda, M., Xiong, S.Y., Chumakov, Y., Cortona, P. and Volz, S. (2012) Structure Impact on the Thermal and Electronic Properties of Bismuth Telluride by Ab-Initio and Molecular Dynamics Calculations. Journal of Physics: Conference Series, 395, Article ID: 012114. https://doi.org/10.1088/1742-6596/395/1/012114</mixed-citation></ref><ref id="scirp.77831-ref23"><label>23</label><mixed-citation publication-type="other" xlink:type="simple">Kimi, M.-Y. and Oh, T.-S. (2011) Processing and Thermoelectric Performance Characterization of Thin-Film Devices Consisting of Electrodeposited Bismuth Telluride and Antimony Telluride Thin-Film Legs. Journal of Electronic Materials, 40, 759-764. https://doi.org/10.1007/s11664-011-1562-8</mixed-citation></ref><ref id="scirp.77831-ref24"><label>24</label><mixed-citation publication-type="other" xlink:type="simple">Wang, H. and Sen, M. (2009) Analysis of the 3-Omega Method for Thermal Conductivity Measurement. International Journal of Heat and Mass Transfer, 52, 2102-2109. https://doi.org/10.1016/j.ijheatmasstransfer.2008.10.020</mixed-citation></ref><ref id="scirp.77831-ref25"><label>25</label><mixed-citation publication-type="other" xlink:type="simple">Tsukada, T., Fukuyama, H. and Kobatake, H. (2007) Determination of Thermal Conductivity and Emissivity of Electromagnetically Levitated High-Temperature Droplet Based on the Periodic Laser-Heating Method: Theory. International Journal of Heat and Mass Transfer, 50, 3054-3061. https://doi.org/10.1016/j.ijheatmasstransfer.2006.12.026</mixed-citation></ref><ref id="scirp.77831-ref26"><label>26</label><mixed-citation publication-type="other" xlink:type="simple">Mavrokefalos, A., Moore, A.L., Pettes, M.T., Shi, L., Wang, W. and Li, X. (2009) Thermoelectric and Structural Characterizations of Individual Electrodeposited Bismuth Telluride Nanowires. Journal of Applied Physics, 105, Article ID: 104318. https://doi.org/10.1063/1.3133145</mixed-citation></ref><ref id="scirp.77831-ref27"><label>27</label><mixed-citation publication-type="other" xlink:type="simple">Choi, J.H., Young, D., Park, S.J., Choo, B.K. and Jang, J. (2003) Temperature Dependence of the Growth of Super-Grain Polycrystalline Silicon by Metal Induced Crystallization. Thin Film Solids, 427, 289-293. https://doi.org/10.1016/S0040-6090(02)01150-1</mixed-citation></ref><ref id="scirp.77831-ref28"><label>28</label><mixed-citation publication-type="other" xlink:type="simple">Chen, C.-L., Chen, Y.-Y., Lin, S.-J., Ho, J.C., Lee, P.-C., Chen, C.-D. and Harutyunyan, S.R. (2010) Fabrication and Characterization of Electrodeposited Bismuth Telluride Films and Nanowires. The Journal of Physical Chemistry C, 114, 3385-3389. https://doi.org/10.1021/jp909926z</mixed-citation></ref><ref id="scirp.77831-ref29"><label>29</label><mixed-citation publication-type="journal" xlink:type="simple"><name name-style="western"><surname>Pradyumnan</surname><given-names> P.P. and Swathikrishnan </given-names></name>,<etal>et al</etal>. (<year>2010</year>)<article-title>Thermoelectric Properties of Bi2Te3 and Sb2Te3 and Its Bilayer Thin Films</article-title><source> Indian Journal of Pure &amp; Applied Physics</source><volume> 48</volume>,<fpage> 115</fpage>-<lpage>120</lpage>.<pub-id pub-id-type="doi"></pub-id></mixed-citation></ref><ref id="scirp.77831-ref30"><label>30</label><mixed-citation publication-type="other" xlink:type="simple">Lee, H., Attar, A. and Weera, S. (2015) Performance Prediction of Commercial Thermoelectric Cooler Modules Using the Effective Material Properties. Journal of Electronic Materials, 44, 2157-2165. https://doi.org/10.1007/s11664-015-3723-7http://homepages.wmich.edu/~leehs/ME695/Thermoelectric%20Coolers%20for%20class.pdf</mixed-citation></ref><ref id="scirp.77831-ref31"><label>31</label><mixed-citation publication-type="other" xlink:type="simple">Abdel-Motaleb, I. and Qadri, S. Multi-Physics Numerical Simulation of Thermoelectric Devices. (In Preparation)</mixed-citation></ref><ref id="scirp.77831-ref32"><label>32</label><mixed-citation publication-type="other" xlink:type="simple">Venkatasubramanian, R., Siivola, E., Colpitts, T. and O’Quinn, B. (2001) Thin-Film Thermoelectric Devices with High Room-Temperature Figures of Merit. Nature, 413, 597-602.</mixed-citation></ref></ref-list></back></article>