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J. D. Cho, H. T. Ju, Y. S. Park and J. W. Hong, “Kinetics of Cationic Photopolymerizations of UV-Curable Epoxy-Based SU8-Negative Photoresists with and without Silica Nanoparticles,” Macromolecular Materials and Engineering, Vol. 291, No. 9, 2006, pp. 1155-1163. http://dx.doi.org/10.1002/mame.200600124

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