Article citationsMore>>

Hayashi, “High Rate Deposition of TiO2 by DC Sputtering of the TiO2-x Target,” Thin Solid Films, Vol. 392, No. 2, 2001, pp. 169-173. doi:10.1016/S0040-6090(01)01023-9

has been cited by the following article:

SCIRP Newsletter
Copyright © 2006-2026 Scientific Research Publishing Inc. All Rights Reserved.
Top