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Zhang, Y.J., Yan, P.X., Wu, Z.G., Zhang, W.W., Zhang, G.A., Liu, W.M. and Xue, Q.J. (2005) Effects of substrate bias and argon flux on the structure of titanium nitride films deposited by filtered cathodic arc plasma. Physica status solidi (a), 202(1), 95-101. doi:10.1002/pssa.200406902

has been cited by the following article:

• TITLE: Features of the formation and nanostructure of the film with the basic hexagonal phase TiN0.3 by arc evaporation

  AUTHORS: Anna L. Kameneva, L'ybov N. Guselnikova, Tatyana O. Soshina

  KEYWORDS: TiN Film; Arc Spraying; Forming and Nanostructuring Processes; Structure and Phase Modification

  JOURNAL NAME: Journal of Biophysical Chemistry, Vol.2 No.1, February 22, 2011

  ABSTRACT: Forming and nanostructuring processes of TiN film by electric arc evaporation under the conditions of the reactive nitrogen gas deficit in the gas mixture (30%) have been investigated. The results of a technological experiment, electron microscopic examination, X-ray diffraction phase analysis and mechanical testing of the film revealed that a significant increase in ion density and mobility leads to deterioration of the formation temperature conditions, structural and phase changes in TiN film and change of the main cubic phase (111)TiN on a hexagonal (101)TiN0.3. In the end repeated decrease of the the film microhardness with (101)TiN0.3 was caused not only by erosion of the film, but also because of change in the processes of its formation and nanostructuring in comparison with similar processes of the film with (111)TiN.