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A. W. Ott, K. C. McCarley, J. W. Klaus, J. D. Way and S. M. George, “Atomic Layer Controlled Deposition of Al2O3 Films Using Binary Reaction Sequence Chemistry,” Applied Surface Science, Vol. 107, 1996, pp. 128-136. doi:10.1016/S0169-4332(96)00503-X

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