TITLE:
Microstructure and 355 nm Laser-Induced Damage Characteristics of Al2O3 Films Irradiated with Oxygen Plasma under Different Energy
AUTHORS:
Dongping Zhang, Yan Li, Jingting Luo, Zhuanghao Zheng, Guangxing Liang, Xingmin Cai, Fan Ye, Ping Fan, Jianjun Huang
KEYWORDS:
Thin Film; Laser-Induced Damage; Electron Beam Evaporation; Plasma Irradiation
JOURNAL NAME:
Optics and Photonics Journal,
Vol.3 No.2,
June
5,
2013
ABSTRACT: Al2O3 films were prepared using electron
beam evaporation at room temperature. The samples were irradiated with oxygen plasma
under different energy. The variations in average surface defect density and root
mean square (RMS) surface roughness were characterized using an optical microscope
and an atomic force microscope. Surface average defect density increased after plasma
treatment. The RMS surface roughness of the samples decreased from 1.92 nm to 1.26 nm because
of surface atom restructuring after oxygen plasma conditioning. A 355 nm laser-induced
damage experiment indicated that the as-grown sample with the lowest defect density
exhibited a higher laser-induced damage threshold (1.12 J/cm2) than
the other treated samples. Laser-induced damage images revealed that defect is one
of the key factors that affect laser-induced damage on Al2O3 films.