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M. H. Jo, J. K. Hong, H. H. Park, J. J. Kim, S. H. Hyun and S. Y. Choi, “Application of SiO2 Aerogel Film with Low Dielectric Constant to Intermetal Dielectrics,” Thin Solid Films, Vol. 308-309, 1997, pp. 490-494. doi:10.1016/S0040-6090(97)00437-9

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