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D. V. Shtansky, E. A. Levashov, A. N. Sheveiko and J. J. Moore, “Synthesis and Characterization of Ti-Si-C-N Films,” Metallurgical and Materials Transaction A, Vol. 30, No. 9, 1999, pp. 2439-2447. doi:10.1007/s11661-999-0252-0

has been cited by the following article:

• TITLE: Forming Stages of Polycrystalline TiN Films Depending on the Nitrogen Concentration in Mixed Gas

  AUTHORS: Anna L. Kameneva

  KEYWORDS: Polycrystalline TiN Film, Arc Spraying, Temperature Conditions, Forming Stages, Structure and Phase Modification

  JOURNAL NAME: Materials Sciences and Applications, Vol.2 No.1, January 25, 2011

  ABSTRACT: The influence of nitrogen concentration in mixed gas on temperature conditions, structure and phase composition of the TiN film deposited by arc spraying has been investigated. By electron microscopic investigations and X-ray diffraction phase analysis was recognized forming stages and structuring process of the film with main cubic phase (111) TiN. It was discovered that forming stages and process of structuring of ion-plasma TiN films are affected by both film temperature and its rate of heating.