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J. S. Becker and R. G. Gordon, “Diffusion Barrier Properties of Tungsten Nitride Films Grown by Atomic Layer Deposition from Bis(Tert-Butylimido)Bis(Dimethylamido) Tungsten and Ammonia,” Applied Physics Letters, Vol. 82, No. 14, 2003, 7 Pages. doi:10.1063/1.1565699

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