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S. B. Odinokov and G. R. Sagatelyan, “Technology of Manufacturing of Diffraction and Hologram Optical Parts with Functional Microrelief of Surface by Method of Plasma-Chemical Etching,” Vestnik MGTU, Priborostroenie, No. 2, 2010, pp. 92-104.

has been cited by the following article:

• TITLE: The Design and Manufacturing of Diffraction Optical Elements to form a Dot-Composed Etalon Image within the Optical Systems

  AUTHORS: Sergey Borisovich Odinokov, Hike Rafaelovich Sagatelyan

  KEYWORDS: Optical Glass; Plasma-Chemical Etching; Selectivity; Diffraction Gratings; Micro-Optics

  JOURNAL NAME: Optics and Photonics Journal, Vol.3 No.1, March 26, 2013

  ABSTRACT: The possibilities of manufacturing of diffraction optical elements (DOE), using the “Caroline 15 PE” plasma-etching machine were considered. It is established that at thickness of chromic mask of 100 nm the plasma-chemical etching (PCE) method reaches depth of surface micro-profile to 1.4 μm on optical glass. It allows increasing the diffraction efficiency of DOE to 0.3 - 0.35 on the second order of diffraction.