Article citationsMore>>

D. A. Zeze, R. D. Forrest, J. P. Cary, D. C. Cox, I. D. Robertson, B. L. Weiss and S. R. P. Silva, “Reactive Ion Etching of Quartz and Pyrex for Microelectronic Applications,” Journal of applied physics, Vol. 92, No. 7, 2002, pp. 3824-3829. doi:10.1063/1.1503167

has been cited by the following article:

• TITLE: The Design and Manufacturing of Diffraction Optical Elements to form a Dot-Composed Etalon Image within the Optical Systems

  AUTHORS: Sergey Borisovich Odinokov, Hike Rafaelovich Sagatelyan

  KEYWORDS: Optical Glass; Plasma-Chemical Etching; Selectivity; Diffraction Gratings; Micro-Optics

  JOURNAL NAME: Optics and Photonics Journal, Vol.3 No.1, March 26, 2013

  ABSTRACT: The possibilities of manufacturing of diffraction optical elements (DOE), using the “Caroline 15 PE” plasma-etching machine were considered. It is established that at thickness of chromic mask of 100 nm the plasma-chemical etching (PCE) method reaches depth of surface micro-profile to 1.4 μm on optical glass. It allows increasing the diffraction efficiency of DOE to 0.3 - 0.35 on the second order of diffraction.