TITLE:
The Design and Manufacturing of Diffraction Optical Elements to form a Dot-Composed Etalon Image within the Optical Systems
AUTHORS:
Sergey Borisovich Odinokov, Hike Rafaelovich Sagatelyan
KEYWORDS:
Optical Glass; Plasma-Chemical Etching; Selectivity; Diffraction Gratings; Micro-Optics
JOURNAL NAME:
Optics and Photonics Journal,
Vol.3 No.1,
March
26,
2013
ABSTRACT: The possibilities of manufacturing of diffraction optical elements (DOE), using the “Caroline 15 PE” plasma-etching machine were considered. It is established that at thickness of chromic mask of 100 nm the plasma-chemical etching (PCE) method reaches depth of surface micro-profile to 1.4 μm on optical glass. It allows increasing the diffraction efficiency of DOE to 0.3 - 0.35 on the second order of diffraction.