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C. C. Chen, K.F. Chiu, K. M. Lin, H. C. Lin, C.-R. Yang and F. M. Wang, “Combinational Effects of Oxygen Plasma Irradiation and Annealing on LiMn2O4 Thinfilm Cathodes,” Journal of Electrochemical Science, Vol. 158, No. 3, 2011, pp. A262-A265. doi:10.1149/1.3531988

has been cited by the following article:

• TITLE: Growth, Microstructure and Electrochemical Properties of RF Sputtered LiMn2O4 Thin Films on Au/Polyimide Flexible Substrates

  AUTHORS: K. Jayanth Babu, P. Jeevan Kumar, Obili M. Hussain

  KEYWORDS: LiMn2O4 Thin Films; RF-Sputtering; Flexible Kapton Substrates; Microstructure

  JOURNAL NAME: Materials Sciences and Applications, Vol.4 No.2, February 28, 2013

  ABSTRACT: LiMn2O4 thin films are deposited on gold coated polyimide flexible substrates using RF magnetron sputtering technique maintained at a moderate substrate temperature of 300℃. The films exhibited characteristic peaks with predominant (111) orientation representing cubic spinel structure of Fd3m symmetry with an evaluated lattice parameter of 8.199 ?. The surface topography of films exhibited pyramidal shaped grains oriented vertical to the substrate surface with root mean square surface roughness of 90 nm. The Pt/LiMn2O4 electrochemical cell in aqueous region exhibited two step de-insertion and insertion kinetics of Li ion during oxidation and reduction reaction with an initial discharge capacity of 36 μAh?cm_2?μm_1.