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A. Schreiber, B. Kühn, E. Arnold, F.-J. Schilling and H.-D. Witzke, “Radiation Resistance of Quartz Glass for VUV Discharge Lamps,” Journal of Physics D: Applied Physics, Vol. 38, No. 17, 2005, pp. 3242-3250. doi:10.1088/0022-3727/38/17/S28

has been cited by the following article:

• TITLE: Difference in Structural Relaxation Times of Inner Surface and Inner Bulk Region of Silica Glass Arc Tube

  AUTHORS: Takuya Honma, Nobuhiro Tamura, Kazuya Saito, Edson Sekiya

  KEYWORDS: Structural Relaxation Time; Fictive Temperature; High-Intensity Discharge Lamps

  JOURNAL NAME: New Journal of Glass and Ceramics, Vol.3 No.1, January 29, 2013

  ABSTRACT: The fictive temperature and structural relaxation of a silica glass arc tube were investigated to elucidate the origin of cracking in the arc tubes used in high-intensity discharge lamps for vacuum ultraviolet light sources. The structural relaxation time near the inner surface was decreased much more than that in the inner bulk region, resulting in a large difference in the fictive temperature between these two areas at high-intensity discharge lamp operating temperatures. This difference should induce strain in the silica glass network. On the basis of our results, we suggest ways to avoid cracking and extend the lifetime of high-intensity discharge lamps.