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D. F. Wang, A. Takahashi, Y. Matsumoto, K. M. Itoh, Y. Yamamoto, T. Ono and M. Esash, “Magnetic Mesa Structures Fabricated Reactive Ion Etching with CO/NH3/Xe Plasma Chemistry for an All-Silicon Quantum Computer,” Nanotechnology, Vol. 16, No. 6, 2005, pp. 990-994. doi:10.1088/0957-4484/16/6/062

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