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J. Hopwood, “Review of Inductively Coupled Plasmas for Plasma Processing,” Plasma Sources Science and Technology, Vol. 1, No. 2, 1992, pp. 109-116. doi:10.1088/0963-0252/1/2/006

has been cited by the following article:

• TITLE: A Supersonic Plasma Jet Source for Controlled and Efficient Thin Film Deposition

  AUTHORS: Ilaria Biganzoli, Francesco Fumagalli, Fabio Di Fonzo, Ruggero Barni, Claudia Riccardi

  KEYWORDS: Plasma Sources; ICP Discharges; PECVD; Plasma Diagnostics; Titanium Dioxide; Thin Film Deposition

  JOURNAL NAME: Journal of Modern Physics, Vol.3 No.10A, October 31, 2012

  ABSTRACT: A novel plasma source suitable for controllable nanostructured thin film deposition processes is proposed. It exploits the separation of the process in two distinct phases. First precursor dissociation and radical formation is performed in a dense oxidizing plasma. Then nucleation and aggregation of molecular clusters occur during the expansion into vacuum of a supersonic jet. This allows a superior control of cluster size and energy in the process of film growth. Characterization of the plasma state and source performances in precursor dissociation have been investigated. The performances of this new Plasma Assisted Supersonic Jet Deposition technique were demonstrated using organic compounds of titanium to obtain TiO2 thin nanostructured films.