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M. K. Mishra, A. Phukan and M. Chakraborty, “Effect of Cathode and Anode Voltage on an Ion Sheath Thickness in a Magnetically Confined Diffusion Plasma,” Contributions to Plasma Physics, Vol. 47, No. 10, 2007, pp. 677- 682. doi:10.1002/ctpp.200710077

has been cited by the following article:

• TITLE: Dependence of Plasma Parameters on Plate Separation and Filament Location in a Double Plasma Device

  AUTHORS: Monojit Chakraborty, Bidyut Kumar Das, Mrinal Kumar Mishra, Mainak Bandyopadhyay

  KEYWORDS: Filament Location; Plasma Parameters; Double Plasma Device

  JOURNAL NAME: Journal of Modern Physics, Vol.3 No.9, September 24, 2012

  ABSTRACT: A pair of stainless steel (ss) plates separates the source and target regions of a double plasma device. Two sets of tungsten filaments, placed at different distances from the ss plates, are then used to produce plasma alternately and the plasma parameters in the source and target regions for different discharge voltage, discharge current and plate separation are measured using Langmuir probes. It is found that plasma density and electron temperature are considerably affected and respond differently to changes in the plate separations and the position of the filaments.