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J. D. Klein, S. L. Clauson and S. F. Cogan, “The Influence of Substrate Bias on the Morphology and Charge Capacity of RF-Sputtered Iridium Oxide Films,” Journal of Materials Research, Vol. 4, No. 6, 1989, 1505-1510. doi:10.1557/JMR.1989.1505

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