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R. Ikada, G. Nishimura, K. Kato and S. Iizuka, “Production of High Density and Low Electron-Temperature Plasma by a Modified Grid-Biasing Method Using Inductively Coupled RF Discharge,” Thin Solid Films, Vol. 457, No. 1, 2004, pp. 55-58. doi:10.1016/j.tsf.2003.12.013

has been cited by the following article:

• TITLE: Diamond Particles Deposited among Nickel/Copper Particles in Energy Controlled CH4/H2 RF Discharge Plasmas

  AUTHORS: Junichi Emi, Satoru Iizuka

  KEYWORDS: Diamond Microparticle; Diamond Growth; Self-Organization; Graphite; Cu Particle

  JOURNAL NAME: Journal of Surface Engineered Materials and Advanced Technology, Vol.2 No.3, July 25, 2012

  ABSTRACT: Formation of diamond particles was investigated in an energy-controlled CH4/H2 radio-frequency (RF) discharge plasma. Here, in particular, it was examined how diamond particles grew on a nickel substrate under an influence of Cu vapor that was supplied from a heated Cu wire. Here, the plasma was generated by a hollow-magnetron-type (HMT) RF plasma source at the frequency of 13.56 MHz. Total pressure was kept at 100 mTorr. Diamond particles grew besides Ni and Cu particles. From Raman spectrum the substrate surface was covered with thin graphite film deposited as a background layer. It was shown that diamond could grow in a self-organized manner even when the other atomic gas species such as Ni and Cu were contained in the gas at the same time during the growth process.