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C. W. Ow-Yang, Y. Shigesato and D. C. Paine, “Interface Stability of an Indium Tin Oxide Thin Film Deposited on Si and Si0.85Ge0.15,” Journal of Applied Physics, Vol. 88, No. 6, 2000, pp. 3717-3724. doi:10.1063/1.1288694

has been cited by the following article:

• TITLE: Current-Voltage Characteristics of ITO/p-Si and ITO/n-Si Contact Interfaces

  AUTHORS: Gopal G. Pethuraja, Roger E. Welser, Ashok K. Sood, Changwoo Lee, Nicholas J. Alexander, Harry Efstathiadis, Pradeep Haldar, Jennifer L. Harvey

  KEYWORDS: Sputtered Amorphous Silicon; Electrical Contact Characteristics; ITO/Si Contact

  JOURNAL NAME: Advances in Materials Physics and Chemistry, Vol.2 No.2, June 20, 2012

  ABSTRACT: We investigated the electrical contact characteristics of indium tin oxide (ITO)/doped hydrogenated amorphous silicon (a-Si:H) junctions. For efficient collection of photo-generated carriers, photovoltaic and photodetector devices require good ohmic contacts with transparent electrodes. The amorphous-Si thin films were sputter deposited on ITO coated glass substrates. As-deposited p-type a-Si:H on ITO formed nearly ohmic type contacts and further annealing did not improve the contact characteristics. On the other hand, as-deposited n-type a-Si:H on ITO formed an ohmic contact, while further annealing resulted in a Schottky type contact. The ITO contact with p-type silicon semiconductor is a ro-bust ohmic contact for Si based optoelectronic devices.