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D. Y. Fozdar, W. Zhang, M. Palard, C. W. P. Jr and S. Chen, “Flash Imprint Lithography Using a Mask Aligner: A Method for Printing Nanostructures in Photosensitive Hydrogels,” Nanotechnology, Vol. 19, No. 21, 2008, pp. 215-303. doi:10.1088/0957-4484/19/21/215303

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