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Q. Kong, L. Ji, H. Li, X. Liu, Y. Wang, J. Chen and H. Zhou, “Influence of Substrate Bias Voltage on the Microstructure and Residual Stress of CrN Films Deposited by Medium Frequency Magnetron Sputtering,” Materials Science and Engineering B, Vol. 176, No. 11, 2011, pp. 850-854. doi:10.1016/j.mseb.2011.04.015

has been cited by the following article:

• TITLE: Influence of Substrate Bias Voltage on the Properties of Sputtered Aluminum-Scandium Thin Sheets

  AUTHORS: Julien Kovac, Heinz-Rolf Stock, Hans-Werner Zoch

  KEYWORDS: Aluminum-Scandium Alloy; Magnetron Sputtering; Freestanding Thin Films; Bias Voltage

  JOURNAL NAME: Journal of Surface Engineered Materials and Advanced Technology, Vol.2 No.2, April 26, 2012

  ABSTRACT: Thin sheets (20 μm - 30 μm) of an aluminum-scandium alloy were manufactured by magnetron sputtering with a homogeneous thickness distribution. The influence of bias voltage on the sheet properties was investigated. Steel sheets of 100 μm were employed as substrate and were coated in a dc magnetron sputtering unit fitted with a rectangular target of aluminum 2.0 w% scandium master alloy. After deposition, the substrates were dissolved in an oxidizing medium and thus freestanding aluminum-scandium thin films were obtained. The homogeneous thickness was achieved by a reciprocal movement of the substrate. The influence of a radio frequency bias voltage on the coating properties was investigated. The bias voltage resulted in an important coarsening of the columnar structure as well as an increase of the roughness and hardness. Additionally, a low bias voltage could intensively reduce the coating defect density without altering too much the sheet properties.