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Ma, H.P., Lu, H.J., Yang, J.H., Li, X.X., Wang, T., Huang, W., et al. (2018) Measurements of Microstructural, Chemical, Optical, and Electrical Properties of Silicon-Oxygen-Nitrogen Films Prepared by Plasma-Enhanced Atomic Layer Deposition. Nanomaterials, 8, Article 1008.
https://doi.org/10.3390/nano8121008

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