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S. Y. Han, D. H. Lee, Y. J. Chang, S. O. Ryu, T. J. Lee and C. H. Chang, “The Growth Mechanism of Nickel Oxide Thin Films by Room-Temperature Chemical Bath Deposition,” Journal of the Electrochemical Society, Vol. 153, No. 6, 2006, pp. C382-C386. doi:10.1149/1.2186767

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