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Pirkle, A., Chan, J., Venugopal, A., Hinojos, D., Magnuson, C.W., McDonnell, S., et al. (2011) The Effect of Chemical Residues on the Physical and Electrical Properties of Chemical Vapor Deposited Graphene Transferred to SiO2. Applied Physics Letters, 99, Article ID: 122108.
https://doi.org/10.1063/1.3643444

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