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Yeung, M. and Barouch, E. (2023) Binary Solution for Optimization of Pixelated EUV Source Using Constrained Mathematical Programming. Optical and EUV Nanolithography XXXVI, SPIE Advanced Lithography + Patterning, San Jose, California, United States, 26 February-2 March 2023, 124940K.
https://doi.org/10.1117/12.2659099

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