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W. W. Ng, C. S. Hong and A. Yariv, “Holographic Inter- ference Lithography for Integrated-Optics,” IEEE Trans- actions on Electron Devices, Vol. 25, No. 10, 1978, pp. 1193-1200. doi:10.1109/T-ED.1978.19251

has been cited by the following article:

• TITLE: Bragg-Angle Diffraction in Slant Gratings Fabricated by Single-Beam Interference Lithography

  AUTHORS: Xinping Zhang, Shengfei Feng, Tianrui Zhai

  KEYWORDS: Slant Grating; Single-Beam Interference Lithography; Bragg-Angle Diffraction

  JOURNAL NAME: Optics and Photonics Journal, Vol.2 No.1, March 28, 2012

  ABSTRACT: A single-beam interference-lithography scheme is demonstrated for the fabrication of large-area slant gratings, which requires exposure of the photoresist thin film spin-coated on a glass plate with polished side-walls to a single laser beam in the ultraviolet and requires small coherence length of the laser. No additional beam splitting scheme and no adjustments for laser-beam overlapping and for optical path-length balancing are needed. Bragg-angle diffractions are observed as strong optical extinction that is tunable with changing the angle of incidence. This device is important for the design of efficient filters, beam splitters, and photonic devices.