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Caillau, M., Crémillieu, P., Laurenceau, E., Chevolot, Y., Leclercq, J., Alekseev, S., et al. (2017) Fifty Nanometer Lines Patterned into Silica Using Water Developable Chitosan Bioresist and Electron Beam Lithography. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 35, 06GE01.
https://doi.org/10.1116/1.4996870

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