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K. Nakano, S. Iwasa, K. Maeda and E. Hasegawa, “Thermally Stable Alkylsulfonium Salts for ArF Excimer Laser Resists,” Journal of Photopolymer Science and Technology, Vol. 14, No. 3, 2001, pp. 357-362. doi:10.2494/photopolymer.14.357

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