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M. D. Rahman, D. S. McKenzie, J. B. Bae, T. Kudo, W. K. Kim, M. Padmana-ban and R. R. Dammel, “Novel Hybrid Copolymers of Cycloo-lefin/Maleic Anhydride (COMA)/Methacrylate for 193-nm Resist Compositions,” Proceedings of the 18th International Society for Optical Engineering, Advances in Resist Technology and Processing, Santa Clara, Vol. 4345, 25 February-2 March 2001, pp. 159-167.

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