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Liu, C., Yu, T., Wang, R., Zhang, L., Huang, R., Kim, D., et al. (2010) Negative-bias Temperature Instability in Gate-All-Around Silicon Nanowire MOSFETS: Characteristic Modeling and the Impact on Circuit Aging. IEEE Transactions on Electron Devices, 57, 3442-3450.
https://doi.org/10.1109/ted.2010.2077638

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