Article citationsMore>>

Das, U.K. and Bhattacharyya, T.K. (2020) Opportunities in Device Scaling for 3-nm Node and Beyond: FinFET versus GAA-FET versus UFET. IEEE Transactions on Electron Devices, 67, 2633-2638.
https://doi.org/10.1109/ted.2020.2987139

has been cited by the following article:

SCIRP Newsletter
Copyright © 2006-2026 Scientific Research Publishing Inc. All Rights Reserved.
Top