Article citationsMore>>

McPherson, J.W. and Mogul, H.C. (1998) Underlying Physics of the Thermochemical E Model in Describing Low-Field Time-Dependent Dielectric Breakdown in SiO2 Thin Films. Journal of Applied Physics, 84, 1513-1523.
https://doi.org/10.1063/1.368217

has been cited by the following article:

SCIRP Newsletter
Copyright © 2006-2026 Scientific Research Publishing Inc. All Rights Reserved.
Top