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Li, Y.S., Tang, Y., Yang, Q., Xiao, C. and Hirose, A. (2010) Growth and Adhesion Failure of Diamond Thin Films Deposited on Stainless Steel with Ultra-Thin Dual Metal Interlayers. Applied Surface Science, 256, 7653-7657.
https://doi.org/10.1016/j.apsusc.2010.06.022

has been cited by the following article:

• TITLE: Revolutionizing Material Boundaries: High-Performance Diamond-Coated Steel via Long-Term MPCVD

  AUTHORS: Clyde Varner II, Angela Davis, Leslie Wilson, Padmaja Guggilla

  KEYWORDS: MPCVD (Microwave Plasma Chemical Vapor Deposition), Raman Spectroscopy, Steel Alloys (316L, 4140, 1018), Coatings, Chip-Resistance

  JOURNAL NAME: Journal of Minerals and Materials Characterization and Engineering, Vol.12 No.6, November 13, 2024

  ABSTRACT: This research explores Microwave Plasma Chemical Vapor Deposition (MPCVD) for depositing diamond films on steel alloys (316L, 4140, and 1018) with a vanadium carbide interlayer to enhance adhesion and compatibility. The study reveals that a soft vanadium carbide interlayer and the FCC lattice match lead to a Ta-C film. The results of the graphite inhibition and diamond deposition varied with the steel alloy underlayer composition. In the 316L steel alloy, we successfully formed a thick, compressive strain-induced, sp3-bonded tetrahedral amorphous carbon layer without graphite. The findings have wide-ranging applications in environments demanding high durability and thermal conductivity.