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S. Chatterjeea, S. K. Samantaa, H. D. Banerjeeb and C. K. Maiti, “Electrical Properties of Stacked Gate Dielectric (SiO2/ZrO2) Deposited on Strained SiGe Layers,” Thin Solid Films, Vol. 422, No. 1-2, 2002, pp. 33-38. doi:10.1016/S0040-6090(02)00995-1

has been cited by the following article:

• TITLE: Synthesis and Electrical Characterization of ZrO2 Thin Films on Si(100)

  AUTHORS: Vijay Ramkrishna Chinchamalatpure, Sunil Madhavrao Chore, Shikant Sahebrao Patil, Gajanan Niranjan Chaudhari

  KEYWORDS: Sol-Gel Technique; ZrO2 Thin Film; C –V; I-V

  JOURNAL NAME: Journal of Modern Physics, Vol.3 No.1, January 4, 2012

  ABSTRACT: The ZrO2 thin films deposited on Si (100) were successfully synthesized by solgel process and deposited by using spin-coating technique.The structural properties of ZrO2 thin films were investigated by X-Ray Diffraction (XRD), Scanning Electron Microscope (SEM), Fourier Transform Infrared Spectroscopy (FT-IR), and electrical properties were studied by conventional techniques like Capacitance-Voltage (C-V) measurement and Current–Voltage (I–V) measurement. The XRD of ZrO2 films shows the films crystallized and exists in two phases at 700℃ calcinations temperature. The C–V characteristics of all the dielectric films that involved distinct inversion, depletion, and accumulation were clearly revealed in MIS structure. I-V characteristics of ZrO2 thin films on Si shows decreased saturation current on calcinations temperatures. The XPS measurement reveals that a zirconium silicate interfacial layer has formed in the ZrO2/Si Systems.