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Rasulov, A.M. and Dzhurakhalov, A.A. (2005) Low-Energy P+ Ion Channeling and Implantation into Si(110), SiC(110), GaP(110) and GaAs(110). Computational Materials Science, 33, 148-152.
https://doi.org/10.1016/j.commatsci.2004.12.053

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