Article citationsMore>>

Yang, S.Y., Zavaliche, F., Mohaddes-Ardabili, L., Vaithyanathan, V., Schlom, D.G., Lee, Y.J., et al. (2005) Metalorganic Chemical Vapor Deposition of Lead-Free Ferroelectric BiFeO3 Films for Memory Applications. Applied Physics Letters, 87, Article 102903.
https://doi.org/10.1063/1.2041830

has been cited by the following article:

SCIRP Newsletter
Copyright © 2006-2026 Scientific Research Publishing Inc. All Rights Reserved.
Top