Article citationsMore>>

Lee, Y., Lee, W. and Chun, K. (2000) Calculation of Surface Potential and Beam Deflection due to Charging Effects in Electron Beam Lithography. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 18, 3095.
https://doi.org/10.1116/1.1319822

has been cited by the following article:

SCIRP Newsletter
Copyright © 2006-2026 Scientific Research Publishing Inc. All Rights Reserved.
Top