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H. J. Barnaby, M. Mclain and I. S. Esqueda, “Total-Ion- Izing-Dose Effects on Isolation Oxides in Modern CMOS Technologies,” Nuclear Instruments and Methods in Physics Research B, Vol. 261, No. 1-2, 2007, pp 1142- 1145. doi;10.1016/j.nimb.2007.03.109

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