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Wu, P., Gao, Y.-M., Kershaw, R., Dwight, K. and Wold, A. (1990) Growth and Characterization of Gallium(III) Oxide Films. Materials Research Bulletin, 25, 357-363.
https://doi.org/10.1016/0025-5408(90)90108-E

has been cited by the following article:

• TITLE: XPS Depth Profile Study of Sprayed Ga2O3 Thin Films

  AUTHORS: Towhid Adnan Chowdhury

  KEYWORDS: Ga2O3, Thin Films, x-Ray Photoelectron Spectroscopy, Depth Profiling

  JOURNAL NAME: Engineering, Vol.15 No.8, August 4, 2023

  ABSTRACT: Ga2O3 thin films were fabricated by spray pyrolysis method using gallium acetylacetonate as source material and water as oxidizer. The films were annealed at 450°C for 60 minutes in argon atmosphere. X-ray photoelectron spectroscopy (XPS) depth profile studies were carried out to analyze the stoichiometry and composition of sprayed as-deposited and annealed Ga2O3 thin films. Surface layers and the inner layers of as-deposited and annealed films were found nearly stoichiometric.