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Bahar, J., Lghazi, Y., Youbi, B., Himi, M.A., El Haimer, C., Ouedrhiri, A., et al. (2022) Nucleation and Growth Mechanism of Cuprous Oxide Electrodeposited on ITO Substrate. Materials Today: Proceedings, 66, 187-195.
https://doi.org/10.1016/j.matpr.2022.04.445

has been cited by the following article:

• TITLE: Nucleation and Growth of Thallium on Thin Film Mercury Electrode: Voltammetric, Scanning Electron Microscopy, Chronoamperometric and Electrochemical Impedance Studies

  AUTHORS: Abdoulkadri Ayouba Mahamane, Boubié Guel, Paul-Louis Fabre

  KEYWORDS: Thallium, Mercury Film, Cyclic Voltammetry, Scanning Electron Microscopy, Impedance Measurements

  JOURNAL NAME: American Journal of Analytical Chemistry, Vol.13 No.11, November 9, 2022

  ABSTRACT: Thallium is a heavy metal highly toxic to the biosphere. It can be determined by anodic stripping voltammetry after deposition on mercury film. The aim of this work is to study the conditions and mechanisms of deposition of Hg on glassy carbon electrode and Tl on Hg film by cyclic voltammetry, scanning electron microscopy, chronoamperometry and impedance techniques. The results showed a germination and growth of a 3D Hg phase on glassy carbon electrode. Similarly, the electrodeposition of Tl on Hg follows a 3D three-dimensional nucleation with diffusion controlled growth. The impedance measurements reveal an easier charge transfer on the Tl film.