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Schlachter, F., Barnett, J., Plachetka, U., Nowak, C., Messerscmidt, M., Thesen, M. and Kurz, H. (2016) UV-NIL Based Nanostructuring of Aluminum Using a Novel Organic Imprint Resist Demonstrated for 100 nm Half-Pitch Wire Grid Polarizer. Microelectronic Engineering, 155, 118-121.
https://doi.org/10.1016/j.mee.2016.03.046

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