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Belyaev, A., Marinskiy, D., Wilson, M., D’Amico, J., Jastrzeski, L. and Lagowski, J. (2007) Application of Non-Contact Corona-Kelvin Metrology for Characterization of Plasma Nitrided SiO2. AIP Conference Proceedings, 931, 270-274.
https://doi.org/10.1063/1.2799382
has been cited by the following article:
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TITLE:
Application of Corona Charge Deposition Technique in Thin Film Industry
AUTHORS:
Ila Prasad
KEYWORDS:
Corona Charge, Microchip Technology, Thin Film, Corona Grown Oxide
JOURNAL NAME:
World Journal of Nano Science and Engineering,
Vol.12 No.2,
June
30,
2022
ABSTRACT: With the advent of new materials, microchip industry is investigating new architecture to further scale down the device size. New technologies are on the way to achieving this goal without compromising with the device’s performance and benefits. In this new scenario, corona charge deposition technique (CCDT) has become an indispensable part of the thin film industry. Due to the non-invasive and non-destructive nature of corona charge ions, they are effectively being used to improve the device properties. They are also useful to understand the electrical properties of insulators and other materials. Corona-Kelvin non-contact metrology or the C-KM is the most recent development in this field. In this review, the applications of corona charge deposition technique in the semiconductor industry have been reviewed. Further, the methodology involved is described. The advances as well as challenges and improvements including the future research are also discussed.