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Jena, S., et al. (2019) Influence of Oxygen Partial Pressure on Microstructure, Optical Properties, Residual Stress and Laser Induced Damage Threshold of Amorphous HfO2 Thin Films. J Alloy Compd, 771, 373-381. https://doi.org/10.1016/j.jallcom.2018.08.327

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