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Kurashima, K., Hayashi, M., Habuka, H., Ito, H., Mitani, S., Mizushima, I., and Takahashi, Y. (2019) High-Temperature Reactor Cleaning Using Chlorine Trifluoride Gas for Silicon Carbide Chemical Vapor Deposition. ECS Journal of Solid State Science and Technology, 8, 400-406.
https://doi.org/10.1149/2.0081908jss

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