Article citationsMore>>

Bakowsky, U., Kneuer, C., Rothe, U., Liefeith, K., Frant, M., Dölling, K., Schmid, R., Johnsen, H. and Stenstad, P. (2006) Patent PCT/DE2005/001162.

has been cited by the following article:

• TITLE: Stability Behaviour of Monolayer Tetraether Lipids on the Amino-Silanised Silicon Wafer: Comparative Study between Langmuir-Blodgett Monolayers with Self-Assembled Monolayers

  AUTHORS: Sri Vidawati, Udo Bakowsky, Urich Rothe

  KEYWORDS: Caldarchaeol-PO4, Langmuir-Blodgett Films, Self Assembling Monolayers (SAMs), Amino-Silanised Silicon Wafer

  JOURNAL NAME: Advances in Materials Physics and Chemistry, Vol.10 No.11, November 25, 2020

  ABSTRACT: This study investigated the stability behaviour of molecular monolayer symmetric chemically modified tetraether lipids caldarchaeol-PO4 on the amino-silanised silicon wafer using Langmuir-Blodgett films, Self Assembling Monolayers (SAMs), ellipsometry, and atomic force microscopy (AFM). The monolayers of caldarchaeol-PO4 were stable on the solid surface amino-silanised silicon wafer. The organizations of molecular monolayers caldarchaeol-PO4 by Langmuir-Blodgett method and SAMs have been analyzed. The surface of pressure in Langmuir-Blodgett processing is carried out monolayers caldarchaeol-PO4 more flat island inhomogeneous. Another method of monolayers caldarchaeol-PO4 by SAMs is showed a large flat domain. Monolayers caldarchaeol-PO4 by Langmuir-Blodgett method seems to be stable and chemically resistant after washing with organic solvent and an additional treatment ultrasonification with various thickness lipids arround 2 nm to 6 nm. Conversely, monolayer caldarchaeol-PO4 by SAMs appears fewer than monolayers caldarchaeol-PO4 by Langmuir-Blodgett method, the thickness of various from 1 nm to 3 nm.