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Gallagher, N.B., Wise, B.M., Butler, S.W., White, D.D. and Barna, G.G. (1997) Development and Benchmarking of Multivariate Statistical Process Control Tools for a Semiconductor Etch Process: Improving Robustness through Model Updating. IFAC Proceedings Volumes, 30, 79-84.
https://doi.org/10.1016/S1474-6670(17)43143-0

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