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Xiang, H., Shi, F.-Y., Rzchowski, M.S., Voyles, P.M. and Chang, Y.A. (2011) Epitaxial Growth and Thermal Stability of FeN4 Film on TiN Buffered Si(001) Substrate. J. Appl. Phys., 109, Article ID: 07E126. https://doi.org/10.1063/1.3556919

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