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Zacharaki, C., Tsipas, P., Chaitoglou, S., Fragkos, S., Axiotis, M., Lagoyiannis, A., Negrea, R., Pintilie, L. and Dimoulas, A. (2019) Very Large Remanent Polarization in Ferroelectric HfxZr1-xO2 Grown on Ge Substrates by Plasma Assisted Atomic Oxygen Deposition. Applied Physics Letters, 114, Article ID: 112901.
https://doi.org/10.1063/1.5090036

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