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Park, M.H., Kim, H.J., Kim, Y.J., Lee, W. and Moon, T. (2013) Evolution of Phases and Ferroelectric Properties of Thin Hf0.5Zr0.5O2 Films According to the Thickness and Annealing Temperature. Applied Physics Letters, 102, Article ID: 242905.
https://doi.org/10.1063/1.4811483

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